Buried gate transistor

ABSTRACT

An embodiment of the invention provides a semiconductor fabrication method. The method comprises forming an isolation region between a first and a second region in a substrate, forming a recess in the substrate surface, and lining the recess with a uniform oxide. Embodiments further include doping a channel region under the bottom recess surface in the first and second regions and depositing a gate electrode material in the recess. Preferred embodiments include forming source/drain regions adjacent the channel region in the first and second regions, preferably after the step of depositing the gate electrode material. Another embodiment of the invention provides a semiconductor device comprising a recess in a surface of the first and second active regions and in the isolation region, and a dielectric layer having a uniform thickness lining the recess.

This application is a divisional of U.S. patent application Ser. No.11/175,835, filed on Jul. 6, 2005, entitled “Buried Gate Transistor,”which application is hereby incorporated herein by reference.

TECHNICAL FIELD

This invention relates generally to semiconductor device manufacturingand more particularly to a buried gate transistor for use in asemiconductor device.

BACKGROUND

Integrated circuits, such as ultra-large scale integrated (ULSI)circuits, can include as many as one billion transistors or more. Mosttypically, ULSI circuits are formed of Field Effect Transistors (FETs)formed in a Complementary Metal Oxide Semiconductor (CMOS) process. EachMOSFET includes a gate electrode formed over a channel region of thesemiconductor substrate, which runs between a drain region and sourceregion.

To increase the device density and operation speed of the integratedcircuits, the feature size of transistor within the circuits must bereduced. However, with the continued reduction in device size,sub-micron scale MOS transistors have to overcome many technicalchallenges. As the MOS transistors become smaller and their channellength decreases, problematic short channel effects (SCEs), such as,source to drain leakage become more pronounced.

One solution to decrease the physical dimension of ULSI circuits is toform recessed or buried gate transistors, which have a gate electrodeburied in a substrate recess or trench. Such an architecture allows forgreater circuit density due to less topography above the siliconsurface, thereby creating less ground rule restrictions, and by allowingjunction profiles typically on the silicon plane to form on the verticalside of the gate, e.g., source/drain extensions formed under the spacer.

This type of transistor reduces SCEs by increasing the averageseparation of source and drain without increasing the channel length. Byusing a vertical dimension, such a structure can also be used to allow agreater overlap of the source/drain under the gate without bringing thesource and drain closer. As such the on-state current is increased whilethe SCEs are not degraded. However, effectively forming recessed gatetransistors has been a difficult task.

To reduce SCEs, junction depths are reduced laterally (and vertically)under the gate. However, the reduction of this overlap region (measuredby overlap capacitance, C_(ov)) greatly increases the resistance at thatpoint, thereby reducing the on-state current (I_(on)) and performance ofthe device. With conventional surface-gates in advanced devices,achieving good SCEs degrades the I_(on) due to this lack of overlap.

In light of such problems, alternative structures are required to breakthis C_(ov)-SCEs compromise. There is also a need for these structuresto be readily integratable to constitute such a change in MOSFETarchitecture.

SUMMARY OF THE INVENTION

These and other problems are generally solved or circumvented, andtechnical advantages are generally achieved, by preferred embodiments ofthe present invention that provide methods and structures for buriedgate transistors having improved immunity to SCEs and also forincreasing the junction overlap simultaneously.

An embodiment of the invention provides a semiconductor fabricationmethod. The method comprises forming an isolation region between a firstand a second region in a substrate, forming multiple recesses in thesubstrate surface, and lining the recess with a uniform oxide.Embodiments further include doping a channel region under the bottomrecess surface in the first and second regions separately and depositinga gate electrode material in the recess. Preferred embodiments includeforming source/drain regions adjacent the channel region in the firstand second regions, preferably after the step of depositing the gateelectrode material.

Another embodiment of the invention provides a semiconductor device.Embodiments include a recess in a surface of the first and second activeregions and in the isolation region, and a dielectric layer having auniform thickness lining the recess. Manufacturing the device preferablyincludes forming source/drain regions adjacent the channel region in thefirst and second regions, preferably after the step of depositing thegate electrode material.

Yet another embodiment of the invention provides a transistor having arecessed gate electrode and a method of manufacturing thereof.

The foregoing has outlined rather broadly, the features and technicaladvantages of the present invention in order that the detaileddescription of the invention that follows may be better understood.Additional features and advantages of the invention will be describedhereinafter, which form the subject of the claims of the invention. Itshould be appreciated, by those skilled in the art, that the conceptionand specific embodiment disclosed may be readily utilized as a basis formodifying or designing other structures or processes for carrying outthe same purposes of the present invention. It should also be realized,by those skilled in the art, that such equivalent constructions do notdepart from the spirit and scope of the invention as set forth in theappended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

For a more complete understanding of the present invention, and theadvantages thereof, reference is now made to the following descriptionstaken in conjunction with the accompanying drawings, in which:

FIG. 1 is a side view illustrating a substrate for forming a buried gatetransistor according to an embodiment of the invention;

FIGS. 2A and 2B are side and plan views illustrating forming a recess inactive regions and STI regions for a preferred buried gate transistor;

FIG. 3 is a side view illustrating forming the gate oxide and channeldoping for a buried gate transistor;

FIG. 4 is a side view of an embodiment of the invention illustratingforming sidewall spacers then source/drain regions including metalsilicide;

FIGS. 5 a and 5 b illustrate two of the advantages of embodiments of theinvention;

FIGS. 6-8 illustrate various alternate embodiments of the invention;

FIGS. 9 a-9 c illustrate a first implementation of a circuit usingconcepts of the invention; and

FIGS. 10 a-10 c illustrate a second implementation of a circuit usingconcepts of the invention.

Corresponding numbers and symbols in different figures generally referto corresponding parts unless otherwise indicated. The figures are drawnto clearly illustrate the relevant aspects of the preferred embodimentsand are not necessarily drawn to scale. To more clearly illustratecertain embodiments, a letter indicating variations of the samestructure, material, or process step may follow a figure number.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

The making and using of the presently preferred embodiments arediscussed in detail below. It should be appreciated, however, that thepresent invention provides many applicable inventive concepts that maybe embodied in a wide variety of specific contexts, which are not to belimited to the exemplary embodiments provided herein.

Embodiments of the invention provide an enabling process flow forsimultaneous improvement in short channel effects such as C_(ov) andI_(off). Such a process flow provides several advantages over the priorart. For example, embodiments of the invention include etching ofisolation regions to allow a buried gate connecting multiplesource/drains or for contacting poly on isolation. This providesmultiple benefits, which include less topography problems, simplerprocess flow (only one CMP), less STI recess variation thereby causingless stress and threshold voltage (V_(i)) variation issues. Embodimentsof the invention, also include performing source/drain implants afterelectrode recess and gate formation. Benefits from this includesimultaneous gate and source/drain doping, uniform gate oxide formationsince more uniform doping in substrate during oxidation (only welldoping).

Unlike conventional methods, wherein recessed gate manufacturingincludes source/drain doping before gate formation, embodiments use athin oxide sidewall to gain C_(ov) vs. SCEs. The gate oxide is the samethickness for channel and source/drain overlap region. Benefits fromthis include better on-state performance because the source/drain isvery highly doped where it meets the channel. For maximum on-statecurrent, this contact between the S/D and channel has to be located atthe thinnest oxide, i.e., when C_(ov) is the highest producing thehighest number of carriers in the channel.

The invention will now be described with respect to preferredembodiments in a specific context, namely a method for forming a buriedgate transistor in a CMOS device. Preferred embodiments of the inventioninclude an isolation region, such as a shallow trench isolation (STI)region, between nMOS and pMOS transistors in a CMOS device. Preferredembodiments of the invention provide a robust manufacturing sequence forforming buried gate electrodes both in the STI and active regions.Preferred embodiments include forming the gate dielectric and gateelectrode before performing a source/drain implant.

Unlike conventional methods, which perform the source/drain implantfirst, embodiments of the invention advantageously avoid processingproblems relating to semiconductor recess variation caused bydopant-dependent oxidation and etch rates. These variations, in turn,lead to a non-uniform oxide around the gate. The conventionalsource/drain-implant first approach, therefore, limits the use andrepeatability of buried gate methods and structures. Another advantageachieved with embodiments is that performing the source/drain implantafter the gate formation allows for doping of both nMOS and pMOStransistors at the same time as the source/drain. This saves additionalmask levels or separate in-situ poly gate doping methods.

The invention will now be described with respect to preferredembodiments in a specific context, namely n-channel and p-channeltransistors in a CMOS device. Embodiments of the present invention mayalso be applied, however, to other semiconductor or integrated circuitapplications where one or more recessed gate transistors are utilized.Note that the illustrative embodiments include only one pMOS device andone nMOS device. However, there are typically many (e.g., thousands ormillions) pMOS and nMOS devices formed on a semiconductor substrateduring each of the manufacturing processes described herein.

Turning now to FIG. 1, there is illustrated an embodiment of theinvention, which includes a substrate 102 such as silicon or othersemiconductor materials. The substrate 102 may comprise a single crystalsilicon substrate or a single crystal silicon layer over anothersemiconductor (e.g., Si, SiGe, SiC) or an insulator (e.g., asilicon-on-insulator or SOI substrate). Compound or alloysemiconductors, such as GaAs, InP, SiGe, or SiC, as examples, can beused in place of silicon.

The substrate 102 includes a first active area 104 and a second activearea 106. In the CMOS example that will be described, a p-channeltransistor (pMOS) will be formed in the first active area 104 and ann-channel transistor (nMOS) will be formed in the second active area106. As such, the first active area 104 is lightly doped with n-typedopants and the second active area 106 is lightly doped with p-typedopants. In other embodiments, other devices can be formed. For example,other nMOS transistors, other pMOS transistors, bipolar transistors,diodes, capacitors, resistors and other devices can be formed in activeareas similar to 104 and 106.

As shown in FIG. 1, the first region 104 and the second region 106 areseparated by an isolation region, such as shallow trench isolation (STI)region 108, formed in the substrate 102. The STI region 108 is filledwith a trench filling material, which may comprise an oxide such assilicon dioxide. In one embodiment, the oxide is deposited using a highdensity plasma (HDP) process. In another embodiment, the oxide can bedeposited by the decomposition of tetraethyloxysilane (TEOS). In otherembodiments, other materials can be used. For example, a trench fillingmaterial may be amorphous or polycrystalline (doped or undoped) siliconor a nitride such as silicon nitride. In other embodiments (notillustrated), sidewalls of the trench of the STI region 108 may includea liner. For example, an oxide and/or a nitride liner (not shown) may beformed between the trench filling material and the material comprisingthe substrate 102. Other isolative techniques (e.g., field oxide) arealso possible.

To form the structure of FIG. 1, a buffer layer 112 is formed over thesubstrate 102. The buffer layer 112 serves as stress relieving layerduring subsequent processing, and it may comprise, for example, CVDsilicon oxide. The buffer layer has thickness between about 1 and 50 nm,preferably about 10 nm. Formed on the buffer layer 112 is a hard masklayer 114, such as silicon nitride. The hard mask 114 is preferably aCVD nitride (e.g., Si₃N₄) and is formed to a thickness between about 10and 500 nm. Formed over the hard mask 114 is resist 116, which maycomprise, for example, a PC negative resist for a standard PC mask, or aPC positive resist on a PC inverted mask.

Turning now to FIG. 2 a, there is the structure of FIG. 1 after forminga recess 118 in the surface of the substrate 102. Recesses 118 areformed, preferably at a depth between about 5 nm and about 200 nm. Asillustrated in the plan view of FIG. 2 b, preferred embodiments of theinvention include simultaneously forming recess 118 in the portion ofthe isolation region 108 between interconnecting active regions104/106/107. Simultaneously forming the recess 118 comprises a separateSiO₂ etchant, such as HF, that does not further attack the recessed Si.

Turning now to FIG. 3, there is illustrated the structure of FIGS. 2 aand 2 b after removing resist 116. A gate dielectric 120 is formed inthe recess 118. Preferably, the gate dielectric 120 comprises athermally grown oxide (e.g., SiO₂) between about 0.5 nm and 5 nm thick.It may also comprise a nitride (e.g., Si₃N₄), or combination of oxideand nitride (e.g., SiN, oxide-nitride-oxide sequence). In otherembodiments, a high-k dielectric material having a dielectric constantof about 5.0 or greater, is used as the gate dielectric 120. Suitablehigh-k materials include HfO₂, HfSiO_(x), Al₂O₃, ZrO₂, ZrSiO_(x), Ta₂O₅,La₂O₃, nitrides thereof, Si_(x)N_(y), SiON, HfAlO_(x),HfAlO_(x)N_(1−x−y), ZrAlO_(x), ZrAlO_(x)N_(y), SiAlO_(x),SiAlO_(x)N_(1−x−y), HfSiAlO_(x), HfSiAlO_(x)N_(y), ZrSiAlO_(x),ZrSiAlO_(x)N_(y), combinations thereof, or combinations thereof withSiO₂, as examples. Alternatively, the gate dielectric 120 may compriseother high k insulating materials or other dielectric materials. Thegate dielectric 120 may comprise a single layer of material, oralternatively, the gate dielectric 120 may comprise two or more layers.

The gate dielectric 120 may also be deposited by chemical vapordeposition (CVD), metal organic chemical vapor deposition (MOCVD),physical vapor deposition (PVD), atomic layer deposition (ALD), or jetvapor deposition (JVD), as examples.

After forming the gate dielectric 120 a shallow first dopant implant 122forms a doped channel region 124. Because the shallow implant does notpenetrate the hard mask 114, the highest dopant concentration is in thedoped channel region 124, which is formed beneath the recess 118, asillustrated in FIG. 3. The doped channel region 124 modulates thethreshold voltage for switching the transistor on and off.

Due to the geometry of the recess 118, the doping level at sidewallregions 125 of the recess 118 are doped to a lower level than directlyunderneath the recess 118. As will be described below in connection withpreferred embodiments, the transistor source/drain (228) is formed tomeet the doped channel region 124 near the sidewall regions 125 of therecess 118 where the channel doping concentration is lower. Since thesource/drain 228 meets the channel at this lower channel doping at thesidewalls 125 (not under the lower gate oxide), junction capacitance,gate-induced barrier lowering, hot carrier generation and junctionleakage are all improved.

Next, a gate electrode 126 is formed over the gate dielectric 120. Thegate electrode 126 preferably comprises a semiconductor material, suchas polysilicon or amorphous silicon, although alternatively, othersemiconductor materials may be used for the gate electrode 126. In otherembodiments, the gate electrode 126 may comprise polysilicon, TiN, HfN,TaN, W, Al, Ru, RuTa, TaSiN, NiSi_(x), CoSi_(x), TiSi_(x), Ir, Y, Pt,Ti, PtTi, Pd, Re, Rh, borides, phosphides, or antimonides of Ti, Hf, Zr,TiAlN, Mo, MoN, ZrSiN, ZrN, HfN, HfSiN, WN, Ni, Pr, VN, TiW, a partiallysilicided gate material, a fully silicided gate material (FUSI), othermetals, and/or combinations thereof, as examples. In one embodiment, thegate electrode 126 comprises a doped polysilicon layer underlying asilicide layer (e.g., titanium silicide, nickel silicide, tantalumsilicide, cobalt silicide, platinum silicide).

If the gate electrode 126 comprises FUSI, for example, polysilicon maybe deposited over the gate dielectric 120, and a metal such as nickelmay be deposited over the polysilicon. Other metals, such as refractorymetals Ta, Ti, Co, Pt, may alternatively be used. The substrate 102 maythen be heated to about 600 or 700° C. to form a single layer of nickelsilicide. The gate electrode 143 may comprise a plurality of stackedgate materials, such as, a metal underlayer with a polysilicon cap layerdisposed over the metal underlayer. A gate electrode 126 between about1000 to 2000 Å thick may be deposited using CVD, PVD, ALD, or otherdeposition techniques.

Next, excess polysilicon from forming gate electrode 126 is removedusing CMP planarization. In preferred embodiments, the hard mask layer114 is removed by wet etching, e.g. HPO₃. Preferably, the source/drainjunction and poly doping implants are done before spacers are formed.This allows for better depth control of the source/drain at the gateoxide edge, as the buffer thickness is better controlled than thethickness of the remaining poly-Si or hard mask after the CMP and RIE asdescribed. In this case, a new hard mask layer (e.g., a thin oxide thennitride, or nitride only) would be deposited and spacers formed asbefore preferably using a RIE. In other embodiments, the S/D can be doneafter the spacer is formed to allow deeper S/D regions away from thegate oxide sidewalls. In all cases, the buffer layer is kept to allowindependent optimization of the relative depths of the source/drain andpoly doping during implantation.

Continuing with FIG. 4, there is further illustrated a CMOS device 202,which includes a p-channel transistor 216 and an n-channel transistor218 preferably including the recessed gate electrodes 126. If the gateelectrodes include a semiconductor, the semiconductor can be dopeddifferently for the p-channel transistor 216 and the n-channeltransistor 218. In both cases though the gate is preferably doped at thesame time as the source/drain regions. In other embodiments, thedifferent types of transistors can include gates of different materials.

Source/drain regions 228 can be formed in the n-well 104 and p-well 106.Preferably, ions (e.g., boron for the pMOS transistor 216 and arsenicand/or phosphorus for the nMOS transistor 218) are implanted, accordingto conventional methods to form heavily doped source/drain regions 228.The dopants can then be activated. For example, a conventional anneal,e.g. by a rapid thermal anneal (RTA) at about 1050° C., can be performedto activate the dopants and reduce implant damage.

For minimal SCEs, the source/drain regions 228 preferably do not extendpast the level of the lower gate oxide, however in some circumstancesthis is possible depending on gate length restrictions. In the preferredcases, the highly-doped source/drain 228 meets the channel at a pointwhere the gate oxide is not thicker than the gate oxide under the gate.This allows for maximum transistor performance due to minimizedS/D-to-channel resistance.

A dielectric such as silicon nitride is deposited and shaped using areactive ion etch to form spacers 214, as illustrated in FIG. 4. Aportion of the buffer layer 112 a remains and is used as an implantoxide for the implants in forming the source/drain regions 228.

A silicide 230 (e.g., nickel silicide) is formed over the source/drainregions 228 and the gate electrode 126. The silicide material 230 may beformed by chemical vapor deposition (CVD), physical vapor deposition,(PVD), or by another deposition means, as examples. The silicide 230 maycomprise cobalt silicide, titanium silicide, tantalum silicide, platinumsilicide, nickel platinum silicide, or other silicides, for example.Preferably, the deposition method used is selective such that nosilicide 230 is formed over spacers 214.

In accordance with preferred embodiments of the invention, spacers 214advantageously prevent the silicide 230 formed over the gate electrode125 from bridging to the silicide 230 formed over the source/drainregions 228. Such an advantage follows, because the spacer can be madeof the required width or height to ensure complete separation of thesubsequent silicide formed on both areas. This is typically greater thanabout 20 nm width or height. As such, having no spacers here or relyingon a thickened gate oxide (typically less than about 5 nm), will resultin an unacceptably low silicide-to-silicide distance and cause silicidebridging, shorting a number of transistors in a circuit.

While not shown, it is understood that an interlayer dielectric (ILD)layer will be formed over the transistors 216 and 218. Suitable ILDlayers include materials such as doped glass (BPSG, PSG, BSG), organosilicate glass (OSG), fluorinated silicate glass (FSG), spun-on-glass(SOG), silicon nitride, and PE plasma enhanced tetraethoxysilane (TEOS),as examples. Typically, gate electrode and source/drain contacts (notshown) are formed through the interlayer dielectric. Metallizationlayers that interconnect the various components are also included in thechip, but not illustrated for the purpose of simplicity.

To summarize, FIG. 4 illustrates an embodiment of the inventioncomprising semiconductor device such as a CMOS device. Embodiments alsoprovide a method of forming such a device, wherein the method comprisesforming an isolation region between a first and a second region in asubstrate. Embodiments further comprise forming a recess in a surface ofthe first and second regions and in the isolation region and forming anoxide layer on a bottom recess surface and a pair of recess sidewalls.Embodiments also include doping a channel region in the first and secondregions, depositing a gate electrode material in the recess, and formingsource/drain regions adjacent the channel region in the first and secondregions, after depositing the gate electrode material.

FIGS. 5 a and 5 b illustrate two advantages of embodiments of theinvention. FIG. 5 a illustrates that the heavily doped source/drainregion 228 meets the channel 124 at a point where the gate dielectric(e.g., gate oxide) is at its thinnest. This point is indicated by thecircle labeled 125. FIG. 5 b illustrates that the height H of the gateelectrode 126 above the surface of the semiconductor body and the widthW of the spacer 214 can be adjusted to optimize the spacing between thesilicide region 230 and the gate electrode 126. This feature will helpavoid silicide bridging, which can create short circuits. Thesefeatures, as well as other features described herein, can be combined orimplemented individually in varying designs.

An exemplary implementation of the invention is illustrated in FIGS. 9a-9 c. FIG. 9 a is a plan view of an nFET 310 and a pFET 315, whichtogether may comprise a component, namely a CMOS inverter, of anintegrated circuit device. FIG. 9 b is a circuit diagram of thestructure illustrated in FIG. 9 a. FIG. 9 c provides a perspective view.

Additional features that can be incorporated with embodiments of theinvention are shown in FIGS. 6-8. FIG. 6 can be used to illustrate theuse of localized halo implantation using silicon recess shadowing. Halosare typically done in advanced devices to improve SCEs, i.e., to stopthe threshold voltage from reducing due to the proximity of the sourceand drain. It is effectively a localized higher channel doping done onlywhere the S/D meets the channel, i.e., having a relatively strongereffect for short channel devices.

In conventional devices, halos are implanted at an angle under the gateto reside at the gate edges. However, halos have to be implanted quitedeep to prevent SCEs arising from the deeper regions of the S/D. Thiscauses a wider spread in halo doping typically spreading into the bulkof the channel. This causes a reduction in channel current (mobility)due to excessive doping increasing carrier scattering in the channel.

In embodiments if the buried gate approach that utilize this feature,the halo implant 452, as illustrated by arrows 450 would be doneimmediately after the channel implant 124. Halo tilt would be tailoredto the silicon recess and hard mask height, typically between 10 and 50degs. The halo would comprise of two half-dose implants separated by a180 deg wafer rotation. This halo implant is useful in advanced devicessince gates are generally aligned in one direction due to lithographyrestrictions for high circuit density. The hard mask provides shadowingof the high-tilt halo implant allowing it to be implanted to the sidesof the channel as desired while preventing it arriving in the majorityof channel.

One major advantage over the conventional surface-gate approach is thatthe energy of the halo can be far shallower due to the lack ofsource/drain below the gate oxide level (no SCEs from source/drain).This allows greater control of the localization of the halo to improveSCEs and prevent mobility degradation. The nature of the source/drainbeing raised above the gate oxide level automatically relieves the doserequirements of the halo. As such, lower doses can be used and incombination with the reduced energy requirements, channel mobility isincreased due to reduced doping levels in the channel.

FIG. 7 is provided to show an raised source/drain embodiment that can beused, for example, to optimize the overlap capacitance Coy. While higherCoy increases Ion, excessive Coy can increase circuit delay due toS/D-to-gate capacitance. To overcome this, the silicon (or othersemiconductor material) recess can be tailored for desired Coy. However,for low Coy (i.e. little Si recess), there are problems with thesource/drains being too shallow (e.g., the silicide cannot be allowed topunch through the source/drain).

The embodiment of FIG. 7 shows one example of the final formation of theburied gate. For smaller recess depths, an epitaxially depositedsemiconductor layer 454, e.g., silicon, can be formed after buffer layerremoval and before source/drain 228 implant to raise the silicide awayfrom the bottom of the source/drain 228. In one embodiment, theepitaxially grown raised source/drain could be used with a shallowrecess, e.g., one that is about 10 nm deep. If desired, the gate 126 maybe capped with a dielectric 456, e.g., TEOS, to prevent silicondeposition on the gate during the epitaxial growth process. This cap 456would be deposited on top of the gate 124 after CMP to hard mask andwould be resistant to the subsequent hard mask wet etch.

This embodiment has a number of features. For example, the contactresistance and leakage are minimized. Another advantage is reducedsilicide contact with gate oxide since spacers are higher, e.g., whenthe silicide is thicker. Further, the epitaxial silicon allows for amuch easier implant for simultaneous source/drain and gate doping (e.g.,the thicknesses can be more similar).

Another embodiment would be to deposit a further spacer layer, e.g.Si₃N₄, immediately on the hard mask after CMP. Preferably, the materialis the same as the hard mask. As such, spacers can then be immediatelyformed by RIE of the hard mask/spacer material. The buffer layer wouldthen be removed prior to S/D implant. As a result of this embodiment,the source/drain could be much deeper away from the gate oxide as it isat the gate oxide as shown in FIG. 8.

In accordance with preferred embodiments of the invention, the nFET 310and pFET 315 devices are surrounded by an isolation structure 108, suchas a shallow trench isolation region. As shown, source region S1 isspaced from drain region D1 by the gate electrode 320 and the sourceregion S2 is spaced from the drain region D2 by the gate electrode 320.The gate electrode 320 is common to both transistor devices 310 and 315.

To form the inverter of FIG. 9 b, the source region S1 is electricallycoupled to the source region S2. This electrical connection can be madethrough metal (not shown) or a local interconnect (not shown), asexamples. In addition, the drain region D1 is electrically coupled to afirst supply voltage node, V_(DD) in this case. The drain region D2 iselectrically coupled to a second supply voltage node, ground in thiscase. These supply connections are typically made through a contact tometal (not shown).

Another embodiment that can utilize concepts of the present is a memorycell such as a DRAM. FIG. 10 a shows a schematic diagram of a DRAM cellthat includes an access transistor 201 coupled in series with a storagecapacitor 564. In this embodiment, the access transistor can be anyembodiment buried gate transistor described above. FIGS. 10 b and 10 cprovide two examples of memory cell structures that include the buriedgate transistor described herein. In particular, FIG. 10 b shows atrench capacitor embodiment and FIG. 10 c shows a stack capacitorembodiment. The elements of FIGS. 10 b and 10 c have been labeledconsistently with the schematic diagram of FIG. 10 a.

Referring now to FIGS. 10 a-10 c, a buried gate transistor includes afirst source/drain region 228 b, which can be electrically coupled to abit line (not shown). The gate 124 is electrically coupled to a wordline (not shown). In a preferred implementation, the gate 124 can serveas the word line and span an entire row of memory cells in an array.(See e.g., FIG. 2, which shows a trench 118 for gate conductor thatspans several active areas.) The word line can be silicided to reduceresistance and can optionally included a parallel metal conductor thatstraps to the gate conductor periodically to further reduce resistance.

The second source/drain 228 a is electrically coupled to a first plate566 of a capacitor 564. In the trench capacitor example (FIG. 10 b), thefirst plate 566 is a conductor within the trench that is coupled to thesource/drain region 228 a via a strap 562. In the stack capacitorexample (FIG. 10 c), the first plate 566 is a first conductive layercoupled to the source/drain 228 a via a highly conductive region 562within substrate 102. The second plate 568 of the capacitor 564 isseparated from the first plate 566 by a capacitor dielectric 570. In thetrench capacitor example (FIG. 10 b), the second plate 568 is a dopedregion within substrate 102. In the stack capacitor example (FIG. 10 c),the second plate 568 is a second conductive layer that overlies thefirst conductive layer.

Although the present invention and its advantages have been described indetail, it should be understood that various changes, substitutions andalterations may be made herein without departing from the spirit andscope of the invention as defined by the appended claims. For example,it will be readily understood by those skilled in the art that materialsand methods may be varied while remaining within the scope of thepresent invention. It is also appreciated, that the present inventionprovides many applicable inventive concepts other than the specificcontexts used to illustrate preferred embodiments. Accordingly, theappended claims are intended to include within their scope suchprocesses, machines, manufacture, compositions of matter, means,methods, or steps.

What is claimed is:
 1. A method of making a semiconductor device, themethod comprising: providing a semiconductor body with a first activeregion, a second active region, and an isolation region between thefirst active region and the second active region; forming a recess in asurface of the semiconductor body, the recess extending across the firstactive region, the isolation region and the second active region, therecess having a first depth from a top surface of the semiconductorbody; forming a gate dielectric within the recess; forming doped channelregions in a bottom surface of the recess in the first and second activeregions; forming a hard mask over the semiconductor body; implantinghalo dopants to form halo regions along entire sidewalls of the recessafter forming the doped channel regions in the first and second activeregions, wherein, during the implanting, the hard mask shadows the halodopants from reaching the bottom surface of the recess and a top surfaceof the semiconductor body adjacent the recess; forming a gate electrodein the recess; forming sidewall spacers adjacent the gate electrode; andafter forming the sidewall spacers, forming first and secondsource/drain regions in the first active region and third and fourthsource/drain regions in the second active region, the first source/drainregion being spaced from the second source/drain region by the gateelectrode and third source/drain region being spaced from the fourthsource/drain region by the gate electrode, wherein the halo regionsextend deeper than the first and second source/drain regions, whereinafter forming the first and second source/drain regions, portions of thedoped channel regions form a non-planar current channel for atransistor, wherein the non-planar current channel comprises a firstportion along a side wall of the gate electrode, a second portion at abottom surface of the gate electrode, and a third portion along anopposite sidewall of the gate electrode, wherein the halo regionsintersect with the non-planar current channel.
 2. The method of claim 1,wherein the first active region comprises an n-doped semiconductor andthe second active region comprises a p-doped semiconductor.
 3. Themethod of claim 1, further comprising: electrically coupling the firstsource/drain region to the third source/drain region; electricallycoupling the second source/drain region to a first supply voltage node;and electrically coupling the fourth source/drain region to a secondsupply voltage node.
 4. A method of making a buried gate, the methodcomprising: forming a recess in a surface of a semiconductor body, therecess having a first depth from a top surface of the semiconductorbody; forming a high-k dielectric liner in the recess; forming a dopedchannel in a bottom surface of the recess; forming halo regions alongsidewalls of the recess after forming the doped channel, wherein formingthe halo regions along sidewalls of the recess comprises forming a hardmask over the semiconductor body, and implanting a halo implant alongentire sidewalls of the recess, wherein the hard mask shadows the haloimplant to reach the bottom surface of the recess and a top surface ofthe semiconductor body adjacent the recess; forming a gate electrode inthe recess; forming sidewall spacers adjacent the gate electrode; andafter forming the sidewall spacers, forming first and second highlydoped source/drain regions in the semiconductor body, the first andsecond highly doped source/drain regions being laterally spaced by thegate electrode, wherein the halo regions extend deeper than the firstand second highly doped source/drain regions, wherein after forming thefirst and second source/drain regions, portions of the doped channelform a non-planar current channel for a buried gate transistor, whereinthe non-planar current channel comprises a first portion along a sidewall of the gate electrode, a second portion at a bottom surface of thegate electrode, and a third portion along an opposite sidewall of thegate electrode, wherein the halo regions intersect with the non-planarcurrent channel.
 5. The method of claim 4, further comprising depositingan epitaxial semiconductor layer before forming the first and secondhighly doped source/drain regions; and siliciding the epitaxialsemiconductor layer.
 6. The method of claim 4, wherein the high-kdielectric liner is conformal along the bottom surface and along thesidewalls of the recess.
 7. The method of claim 4, further comprisingforming sidewalls spacers on a portion of the sidewalls of the gateelectrode before forming the first and second highly doped source/drainregions.
 8. A method of making a buried gate, the method comprising:forming a recess in a surface of a semiconductor body, the recess havinga first depth from a top surface of the semiconductor body; forming adielectric liner in the recess; forming a doped channel in a bottomsurface of the recess; forming halo regions along sidewalls of therecess after forming the doped channel, wherein forming the halo regionsalong sidewalls of the recess comprises forming a hard mask over thesemiconductor body, and implanting a halo implant along entire sidewallsof the recess, wherein the hard mask shadows the halo implant to reachthe bottom surface of the recess and a top surface of the semiconductorbody adjacent the recess; forming a gate electrode in the recess;forming sidewall spacers adjacent the gate electrode; and after formingthe sidewall spacers, forming first and second highly doped source/drainregions in the semiconductor body, the first and second highly dopedsource/drain regions being laterally spaced by the gate electrode,wherein the halo regions extend deeper than the first and second highlydoped source/drain regions, wherein after forming the first and secondsource/drain regions, portions of the doped channel form a non-planarcurrent channel for a buried gate transistor, wherein the non-planarcurrent channel comprises a first portion along a side wall of the gateelectrode, a second portion at a bottom surface of the gate electrode,and a third portion along an opposite sidewall of the gate electrode,wherein the halo regions intersect with the non-planar current channel.9. The method of claim 8, wherein forming the recess compriseslithographically patterning and etching the recess between about 5 nmand about 200 nm.
 10. The method of claim 8, wherein forming thedielectric liner comprises thermally growing an oxide layer.
 11. Themethod of claim 8, wherein forming the gate electrode comprises forminga buried gate electrode that extends out of an active region, the methodfurther comprising: forming sidewall spacers along sidewalls of the gateelectrode on the top surface of the semiconductor body; and forming asilicide over the first and second source/drain regions, the silicidebeing laterally spaced from the gate electrode by the sidewall spacers.12. The method of claim 8, where the halo regions are implanted using atilt angle implant that uses the recess and geometry of the hard mask toshadow, and thereby localize, the implant solely at edges of a channelwhile avoiding implant in bulk of the channel.
 13. The method of claim8, further comprising forming a first raised source/drain region overthe first source/drain region and a second raised source/drain regionover the second source/drain region.